Application Solutions
Factory Automation

Vacuum Pumps for Lithography Equipment

Posted by Dulcie on May 18, 2012
HFE1600 - 1U Hot Swap Front End Power supply

During the manufacture of semiconductors, the wafer undergoes a lithography process which is where the pattern from the mask is transferred to the layer of photoresist. Here specialist lithography equipment depends on the consistent flow of the photoresist onto the surface and this is largely dependent on the reliability of the vacuum pump and small overall size is also an important design factor. One such lithographic pump manufacturer chose the TDK-Lambda HFE1600-48, a high density and efficient AC-DC power supply that delivers reliable 48V bulk power that is programmable via a PM Bus compatible I2C communication interface, which is also used for system monitoring.