{"id":667,"date":"2012-05-18T08:59:14","date_gmt":"2012-05-18T08:59:14","guid":{"rendered":"http:\/\/blog.uk.tdk-lambda.com\/uk\/?p=667"},"modified":"2023-11-30T14:10:46","modified_gmt":"2023-11-30T14:10:46","slug":"vacuum-pumps-for-lithography-equipment","status":"publish","type":"post","link":"https:\/\/blog.uk.tdk-lambda.com\/uk\/2012\/05\/18\/vacuum-pumps-for-lithography-equipment\/","title":{"rendered":"Vacuum Pumps for Lithography Equipment"},"content":{"rendered":"<p><a href=\"https:\/\/www.emea.lambda.tdk.com\/uk\/hfe\" target=\"_blank\" rel=\"noopener\"><img loading=\"lazy\" decoding=\"async\" class=\"aligncenter size-full wp-image-669\" src=\"https:\/\/blog.uk.tdk-lambda.com\/uk\/files\/2012\/05\/HFE1600-500-125.jpg\" alt=\"HFE1600 - 1U Hot Swap Front End Power supply\" width=\"500\" height=\"125\" srcset=\"https:\/\/tdklambdablog.wpenginepowered.com\/uk\/files\/2012\/05\/HFE1600-500-125.jpg 500w, https:\/\/tdklambdablog.wpenginepowered.com\/uk\/files\/2012\/05\/HFE1600-500-125-300x75.jpg 300w\" sizes=\"auto, (max-width: 500px) 100vw, 500px\" \/><\/a><\/p>\n<p>During the manufacture of semiconductors, the wafer undergoes a lithography process which is\u00a0where the pattern from the mask is transferred to the layer of photoresist. Here specialist lithography equipment depends on the consistent flow of the photoresist onto the surface and this is largely dependent on the reliability of the vacuum pump and small overall size is also an important design factor. One such lithographic pump manufacturer chose the TDK-Lambda HFE1600-48, a high density and efficient AC-DC power supply that delivers reliable 48V bulk power that is programmable via a PM Bus compatible I2C communication interface, which is also used for system monitoring.<\/p>\n<p><a title=\"HFE1600 - 1U Hot Swap Front End Power supply\" href=\"https:\/\/www.emea.lambda.tdk.com\/uk\/hfe\" target=\"_blank\" rel=\"noopener\">www.emea.lambda.tdk.com\/uk\/hfe<\/a><\/p>\n","protected":false},"excerpt":{"rendered":"<p>During the manufacture of semiconductors, the wafer undergoes a lithography process which is\u00a0where the pattern from the mask is transferred to the layer of photoresist. Here specialist lithography equipment depends on the consistent flow of the photoresist onto the surface and this is largely dependent on the reliability of the vacuum pump and small overall [&hellip;]<\/p>\n","protected":false},"author":11,"featured_media":0,"comment_status":"open","ping_status":"open","sticky":false,"template":"","format":"standard","meta":{"_acf_changed":false,"footnotes":""},"categories":[3,12,29,22,136],"tags":[],"class_list":["post-667","post","type-post","status-publish","format-standard","hentry","category-application-solutions","category-factory-automation","category-hfe","category-products","category-semiconductor-fabrication"],"acf":[],"yoast_head":"<!-- This site is optimized with the Yoast SEO plugin v27.2 - https:\/\/yoast.com\/product\/yoast-seo-wordpress\/ -->\n<title>Vacuum Pumps for Lithography Equipment &#171; TDK-Lambda UK Blog<\/title>\n<meta name=\"robots\" content=\"index, follow, max-snippet:-1, max-image-preview:large, max-video-preview:-1\" \/>\n<link rel=\"canonical\" href=\"https:\/\/blog.uk.tdk-lambda.com\/uk\/2012\/05\/18\/vacuum-pumps-for-lithography-equipment\/\" \/>\n<meta property=\"og:locale\" content=\"en_GB\" \/>\n<meta property=\"og:type\" content=\"article\" \/>\n<meta property=\"og:title\" content=\"Vacuum Pumps for Lithography Equipment &#171; TDK-Lambda UK Blog\" \/>\n<meta property=\"og:description\" content=\"During the manufacture of semiconductors, the wafer undergoes a lithography process which is\u00a0where the pattern from the mask is transferred to the layer of photoresist. 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